SURFACE RELAXATION IN C(2X2)CL/NI(100) DETERMINED BY THE SOFT-X-RAY STANDING-WAVE METHOD COMBINED WITH SURFACE-EXTENDED X-RAY-ABSORPTION FINE-STRUCTURE SPECTROSCOPY

被引：19

作者：

YOKOYAMA, T

TAKATA, Y

OHTA, T

FUNABASHI, M

KITAJIMA, Y

KURODA, H

机构：

[1] RES DEV CORP JAPAN,TSUKUBA,IBARAKI 30026,JAPAN

[2] NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,OHO,IBARAKI 305,JAPAN

[3] UNIV TOKYO,FAC SCI,DEPT CHEM,TOKYO 113,JAPAN

来源：

PHYSICAL REVIEW B | 1990年 / 42卷 / 11期

关键词：

D O I：

10.1103/PhysRevB.42.7000

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The surface structure of c(2×2)Cl/Ni(100) has been investigated by means of the soft-x-ray standing-wave (SW) method and surface-extended x-ray-absorption fine-structure (SEXAFS) spectroscopy. In the SW experiment, measurements of Ni(200) Bragg reflectivities in the vicinity of normal incidence allowed the determination of the mosaic width of 0.3°of the Ni(100) crystal employed, and the Cl K fluorescence yield spectrum revealed that Cl atoms are located 1.800.03 above the Ni(200) lattice plane. On the other hand, the SEXAFS results elucidated that the Cl-Ni layer spacing is 1.600.02. Combining these data, it was found that the surface nickel layer relaxes outward by 0.200.05 (11% of the bulk spacing). © 1990 The American Physical Society.

引用

页码：7000 / 7005

页数：6

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[21] A SIMPLE, CONTROLLABLE SOURCE FOR DOSING MOLECULAR HALOGENS IN UHV [J].