A GLASS SILICON COMPOSITE INTRACORTICAL ELECTRODE ARRAY

被引:256
作者
JONES, KE [1 ]
CAMPBELL, PK [1 ]
NORMANN, RA [1 ]
机构
[1] UNIV UTAH,DEPT BIOENGN,SALT LAKE CITY,UT 84112
关键词
MICROMACHINING; ELECTRODE ARRAY; NEURAL INTERFACE; INTRACORTICAL ELECTRODES;
D O I
10.1007/BF02368134
中图分类号
R318 [生物医学工程];
学科分类号
0831 ;
摘要
A new manufacturing technique has been developed for creating silicon-based, penetrating electrode arrays intended for implantation into cerebral cortex. The arrays consist of a 4.2 mm X 4.2 mm glass/silicon composite base, from which project 100 silicon needle-type electrodes in a 10 X 10 array. Each needle is approximately 1,500-mu-m long, 80-mu-m in diameter at the base, and tapers to a sharp point at the metalized tip. The technique used to manufacture these arrays differs from our previous method in that a glass dielectric, rather than a p-n-p junction, provides electrical isolation between the individual electrodes in the array. The new electrode arrays exhibit superior electrical properties to those described previously. We have measured inter-electrode impedances of at least 10(13) OMEGA, and interelectrode capacitances of approximately 50 fF for the new arrays. In this paper, we describe the manufacturing techniques used to create the arrays, focusing on the dielectric isolation technique, and discuss the electrical and mechanical characteristics of these arrays.
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页码:423 / 437
页数:15
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