CF4/O2 PLASMA-ETCHING AND SURFACE MODIFICATION OF POLYIMIDE FILMS - TIME-DEPENDENT SURFACE FLUORINATION AND FLUORINATION MODEL

被引:26
作者
SCOTT, PM
MATIENZO, LJ
BABU, SV
机构
[1] IBM CORP,DIV SYST TECHNOL,ENDICOTT,NY 13760
[2] CLARKSON UNIV,DEPT CHEM ENGN,POTSDAM,NY 13676
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1990年 / 8卷 / 03期
关键词
D O I
10.1116/1.576702
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The interaction of CF4/02plasma mixtures with polyimide pyromellitic dianhydride-oxydianiline (PMDA-ODA) films is a complex process. In this investigation, the reactions of PMDA-ODA with a gas mixture containing 90% CF4/10% O2, as a function of treatment time, are studied with x-ray photoelectron spectroscopy (XPS). Curve fitting of the resulting spectra yields the distribution of CFxspecies formed during reaction. A detailed reaction mechanism of F atom addition to PMDA-ODA is constructed on a simplified monomer unit. The experimental results fitted to the proposed model yield apparent reaction rate constants and the time dependent concentration of unstable surface species in the reaction zone. © 1990, American Vacuum Society. All rights reserved.
引用
收藏
页码:2382 / 2387
页数:6
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