THE DEPOSITION OF THIN-FILMS BY FILTERED ARC EVAPORATION

被引：41

作者：

MARTIN, PJ

NETTERFIELD, RP

BENDAVID, A

KINDER, TJ

机构：

来源：

SURFACE & COATINGS TECHNOLOGY | 1992年 / 54卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(92)90152-Z

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The principles of macroparticle filtering in arc evaporation sources are reviewed. The use of passive filtering, internal and external magnetic fields is discussed. The technique of filtering using the magnetic plasma duct is reviewed in detail with emphasis on the properties of deposited films. The filtered arc technique is seen to be a useful method for the deposition of metals, nitrides and oxide films.

引用

页码：136 / 142

页数：7

共 60 条

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