PROPERTIES OF INSULATING THIN FILMS DEPOSITED BY RF SPUTTERING

被引：58

作者：

PLISKIN, WA

DAVIDSE, PD

LEHMAN, HS

MAISSEL, LI

机构：

来源：

IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1967年 / 11卷 / 04期

关键词：

D O I：

10.1147/rd.114.0461

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

页码：461 / &

共 19 条

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[10]

PERRI JA, 1965, SCP SOLID STATE TECH, P19

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