STUDY OF AGING EFFECTS IN A CHEMICAL AMPLIFICATION RESIST - SAL601-ER7

被引：7

作者：

LIU, HY ^{[1
]}

SEEGER, J ^{[1
]}

POON, E ^{[1
]}

OLSEN, RJ ^{[1
]}

GRAZIANO, KA ^{[1
]}

ANDERSON, SE ^{[1
]}

机构：

[1] ROHM & HAAS CO, PHILADELPHIA, PA 19105 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584449

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1740 / 1744

页数：5

共 6 条

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BLUM, L
PERKINS, ME
LIU, HY
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2280 - 2285
[2] DEGRANDPRE M, 1988, SPIE, V923, P158
[3] FRENCHET JMJ, 1985, P PHOTOPOLYMER PRINC
[4] CHARACTERIZATION OF A HIGH-RESOLUTION NOVOLAK BASED NEGATIVE ELECTRON-BEAM RESIST WITH 4-MU-C/CM2 SENSITIVITY
LIU, HY
DEGRANDPRE, MP
FEELY, WE
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 379 - 383
[5] THOMPSON LF, 1983, ACS SYM SER, V219, P87
[6] WALKER JF, 1964, AM CHEM SOC MONO SER, V304