DEPOSITION OF VANADIUM-OXIDE FILMS BY DIRECT-CURRENT MAGNETRON REACTIVE SPUTTERING

被引：45

作者：

KUSANO, E ^{[1
]}

THEIL, JA ^{[1
]}

THORNTON, JA ^{[1
]}

机构：

[1] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575304

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：1663 / 1667

页数：5

相关论文

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