THE INFLUENCE OF DEPOSITION TEMPERATURE ON THE STRUCTURE AND OPTICAL-PROPERTIES OF VANADIUM-OXIDE FILMS

被引：70

作者：

CHAIN, EE

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1986年 / 4卷 / 03期

关键词：

D O I：

10.1116/1.573897

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：432 / 435

页数：4

共 15 条

[1] BUHLING D, 1976, VIDE, V31, P185
[2] MODIFICATIONS IN THE PHASE-TRANSITION PROPERTIES OF PREDEPOSITED VO-2 FILMS
CASE, FC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (04): : 1509 - 1512
[3] RF AND DC REACTIVE SPUTTERING FOR CRYSTALLINE AND AMORPHOUS VO2 THIN-FILM DEPOSITION
DUCHENE, J
TERRAILLON, M
PAILLY, M
[J]. THIN SOLID FILMS, 1972, 12 (02) : 231 - +
[4] SEEMAN-BOHLIN X-RAY DIFFRACTOMETER FOR THIN FILMS
FEDER, R
BERRY, BS
[J]. JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1970, 3 (OCT1) : 372 - &
[5] PREPARATION OF VO2 THIN-FILM AND ITS DIRECT OPTICAL BIT RECORDING CHARACTERISTICS
FUKUMA, M
ZEMBUTSU, S
MIYAZAWA, S
[J]. APPLIED OPTICS, 1983, 22 (02): : 265 - 268
[6] REACTIVELY SPUTTERED VANADIUM DIOXIDE THIN FILMS
FULS, EN
HENSLER, DH
ROSS, AR
[J]. APPLIED PHYSICS LETTERS, 1967, 10 (07) : 199 - &
[7] GRIFFITH.CH, 1974, J APPL PHYS, V45, P2201, DOI 10.1063/1.1663568
[8] LOW-TEMPERATURE REACTIVE SPUTTER DEPOSITION OF VANADIUM-OXIDE
HANSEN, SD
AITA, CR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1985, 3 (03): : 660 - 663
[9] Harper J. M. E., 1978, THIN FILM PROCESSES, P175
[10] TRANSPORT PROPERTIES OF SPUTTERED VANADIUM DIOXIDE THIN FILMS
HENSLER, DH
[J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (05) : 2354 - +