IRRADIATION EFFECTS IN AMORPHOUS AND CRYSTALLINE, SPUTTER-DEPOSITED MO-NI

Amorphous and crystalline MoNi, formed by sputter deposition, have been bombarded with high energy nickel ions to test their response to irradiation. At low temperature (≤570°K) amorphous MoNi shows no effects due to irradiation but crystalline MoNi transforms to the amorphous state. At higher temperature (875°K), irradiation causes crystallization in the amorphous state but induces only barely resovable effects in the crystalline state. It is concluded that irradiation at elevated temperature accelerates the thermally activated processes. These results are in contrast to work on amorphous Nb40Ni60 which showed that irradiation favored the amorphous state up to temperature of 900°K. The reasons for the different behavior in the two materials remain to be explored. © 1979.