Magnetron-sputtered carbon nitride (CNx) films

被引：29

作者：

Kola, P. V. ^{[1
]}

Cameron, D. C. ^{[1
]}

Meenan, B. J. ^{[2
]}

Pischow, K. A. ^{[3
]}

Anderson, C. A. ^{[4
]}

Brown, N. M. D. ^{[4
]}

Hashmi, M. S. J. ^{[1
]}

机构：

[1] Dublin City Univ, Adv Mat Proc Ctr, Dublin 9, Ireland

[2] Univ Ulster, No Ireland Bioengn Ctr, Antrim BT37 0QB, North Ireland

[3] Helsinki Univ Technol, Lab Heart Treatment & Mat Proc, Espoo 02150, Finland

[4] Univ Ulster, Surface Sci LAb, Dept Appl Phys Sci, Coleraine BT52 1SA, Londonderry, North Ireland

来源：

SURFACE & COATINGS TECHNOLOGY | 1995年 / 74-75卷 / 1-3期

关键词：

carbon nitride; magnetron sputtering; thin film deposition; X-ray photoelectron spectroscopy;

D O I：

10.1016/0257-8972(95)08336-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Carbon nitride (CNx) films were deposited by reactive d.c. magnetron sputtering. The structural and compositional properties of the films were characterised as a function of the deposition parameters including nitrogen partial pressure. X-ray photoelectron spectroscopy measurements showed a maximum nitrogen content of approximate to 18 at.%. The presence of C N bonds was confirmed by Raman spectroscopy, which gave a signature characteristic of disordered graphitic material with a reduction in the disorder with increasing nitrogen content. Surface roughness, as measured by atomic force microscopy, was seen to be dependent on both the substrate bias and the system pressure, however no effect of nitrogen partial pressure was evident. The films were generally amorphous, but globules or irregular-shaped surface features were also observed.

引用

页码：696 / 703

页数：8

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