OPTICAL COATINGS DEPOSITED BY REACTIVE ION PLATING

被引:103
作者
WALDORF, AJ
DOBROWOLSKI, JA
SULLIVAN, BT
PLANTE, LM
机构
[1] Institute for Microstructural Sciences, National Research Council of Canada, Ottawa, ON
来源
APPLIED OPTICS | 1993年 / 32卷 / 28期
关键词
D O I
10.1364/AO.32.005583
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The effect of different reactive ion-plating process parameters on the transmittance and the reflectance of single layers of HfO2, Ta2O5, and SiO2 are investigated. The optical constants obtained for these three as-deposited materials are presented. Laser-damage threshold trends are examined on single- and double-layer coatings at 1064 nm and on high-reflectance coatings for 248 nm. Single- and double-cavity filters are constructed for the UV (< 1-nm bandwidth) and near-infrared (50-nm bandwidth) regions, respectively. After the filters are postannealed in air at 375-degrees-C for several hours, a shift in the peak wavelengths is observed along with a substantial increase in the peak transmittance. As expected, no significant wavelength shifts result from changes in the humidity of the ambient atmosphere.
引用
收藏
页码:5583 / 5593
页数:11
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