THE INFLUENCE OF STEPS ON THE EPITAXIAL-GROWTH OF IRON-SILICIDE ON SI(001)

被引：37

作者：

KENNOU, S ^{[1
]}

CHERIEF, N ^{[1
]}

CINTI, RC ^{[1
]}

TAN, TAN ^{[1
]}

机构：

[1] CNRS,ETUD PROPRIETES ELECTR SOLIDES LAB,F-38042 GRENOBLE,FRANCE

来源：

SURFACE SCIENCE | 1989年 / 211卷 / 1-3期

关键词：

D O I：

10.1016/0039-6028(89)90829-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：685 / 691

页数：7

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