COPPER-CATALYZED ETCHING OF SILICON BY F2 - KINETICS AND FEATURE MORPHOLOGY

被引：22

作者：

SELAMOGLU, N

MUCHA, JA

FLAMM, DL

IBBOTSON, DE

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 03期

关键词：

D O I：

10.1063/1.341823

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1494 / 1498

页数：5

共 16 条

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