HOT-ELECTRON EMISSION FROM SILICON UNDER PULSED LASER EXCITATION

被引:3
作者
BENSOUSSAN, M
MOISON, JM
机构
来源
JOURNAL DE PHYSIQUE | 1981年 / 42卷 / NC7期
关键词
D O I
10.1051/jphyscol:1981717
中图分类号
学科分类号
摘要
引用
收藏
页码:149 / 153
页数:5
相关论文
共 16 条
[1]   TIME-RESOLVED REFLECTIVITY OF ION-IMPLANTED SILICON DURING LASER ANNEALING [J].
AUSTON, DH ;
SURKO, CM ;
VENKATESAN, TNC ;
SLUSHER, RE ;
GOLOVCHENKO, JA .
APPLIED PHYSICS LETTERS, 1978, 33 (05) :437-440
[2]  
AUSTON DH, 1979, LASER SOLID INTERACT
[3]   INDUCED ABSORPTION IN SILICON UNDER INTENSE LASER EXCITATION - EVIDENCE FOR A SELF-CONFINED PLASMA [J].
AYDINLI, A ;
LO, HW ;
LEE, MC ;
COMPAAN, A .
PHYSICAL REVIEW LETTERS, 1981, 46 (25) :1640-1643
[4]   MULTIQUANTUM PHOTOEMISSIVE EFFECT IN CONDENSED MEDIA AND STATISTICAL CHARACTERISTICS OF MULTIQUANTUM PHOTOCURRENT .1. [J].
BARASHEV, PP .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1972, 9 (01) :9-&
[5]   2-PHOTON PHOTOEMISSION FROM METALS INDUCED BY PICOSECOND LASER-PULSES [J].
BECHTEL, JH ;
SMITH, WL ;
BLOEMBERGEN, N .
PHYSICAL REVIEW B, 1977, 15 (10) :4557-4563
[6]   PHOTOEMISSION YIELD UNDER 2-QUANTUM EXCITATION IN SI [J].
BENSOUSSAN, M ;
MOISON, JM ;
STOESZ, B ;
SEBENNE, C .
PHYSICAL REVIEW B, 1981, 23 (03) :992-996
[7]   LASER-INDUCED INFRARED ABSORPTION IN SILICON [J].
GAUSTER, WB ;
BUSHNELL, JC .
JOURNAL OF APPLIED PHYSICS, 1970, 41 (09) :3850-&
[8]  
LIN YS, 1979, APPL PHYS LETT, V34, P363
[9]   LASER-INDUCED ELECTRON EMISSION FROM SOLIDS . MANY-PHOTON PHOTOELECTRIC EFFECTS AND THERMIONIC EMISSION [J].
LOGOTHETIS, EM ;
HARTMAN, PL .
PHYSICAL REVIEW, 1969, 187 (02) :460-+
[10]  
MOISON JM, SOLID STATE COMM