THERMAL-ANALYSIS OF POSITIVE PHOTORESIST FILMS BY MASS-SPECTROMETRY

被引：27

作者：

SHAW, JM ^{[1
]}

FRISCH, MA ^{[1
]}

DILL, FH ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1977年 / 21卷 / 03期

关键词：

D O I：

10.1147/rd.213.0219

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

收藏

页码：219 / 226

页数：8

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