LASER DIAGNOSTIC-TECHNIQUES FOR REACTIVE ION ETCHING - PLASMA UNDERSTANDING TO PROCESS-CONTROL

被引：16

作者：

SELWYN, GS

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575597

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2041 / 2046

页数：6

共 24 条

[1] DETECTION OF FLUORESCENCE FROM O-ATOMS AND N-ATOMS INDUCED BY 2-PHOTON ABSORPTION [J].

BISCHEL, WK ;

PERRY, BE ;

CROSLEY, DR .

APPLIED OPTICS, 1982, 21 (08) :1419-1429

[2] 2-PHOTON LASER-INDUCED FLUORESCENCE IN OXYGEN AND NITROGEN-ATOMS [J].

BISCHEL, WK ;

PERRY, BE ;

CROSLEY, DR .

CHEMICAL PHYSICS LETTERS, 1981, 82 (01) :85-88

[3]

CHAPMAN B, 1980, GLOW DISCHARGE PROCE, P59

[4]

Coburn J.W., 1982, PLASMA CHEM PLASMA P, V2, P1, DOI 10.1007/BF00566856

[5] PLASMA-ETCHING - DISCUSSION OF MECHANISMS [J].

COBURN, JW ;

WINTERS, HF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :391-403

[6] 2-PHOTON LASER-INDUCED FLUORESCENCE MONITORING OF O-ATOMS IN A PLASMA-ETCHING ENVIRONMENT [J].

DIMAURO, LF ;

GOTTSCHO, RA ;

MILLER, TA .

JOURNAL OF APPLIED PHYSICS, 1984, 56 (07) :2007-2011

[7] OPTICAL DIAGNOSTICS OF LOW-PRESSURE PLASMAS [J].

DREYFUS, RW ;

JASINSKI, JM ;

WALKUP, RE ;

SELWYN, GS .

PURE AND APPLIED CHEMISTRY, 1985, 57 (09) :1265-1276

[8] PLASMA-ETCHING OF ORGANIC MATERIALS .1. POLYIMIDE IN O2-CF4 [J].

EGITTO, FD ;

EMMI, F ;

HORWATH, RS ;

VUKANOVIC, V .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (03) :893-904

[9] OPTICAL TECHNIQUES IN PLASMA DIAGNOSTICS [J].

GOTTSCHO, RA ;

MILLER, TA .

PURE AND APPLIED CHEMISTRY, 1984, 56 (02) :189-208

[10] NEGATIVE-ION KINETICS IN RF GLOW-DISCHARGES [J].

GOTTSCHO, RA ;

GAEBE, CE .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 1986, 14 (02) :92-102

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