HIGH-TEMPERATURE OXIDATION OF COPPER WITH UP TO 4.1-WT PERCENT SI

被引:10
作者
KAPTEIJN, J
COUPERUS, SA
MEIJERING, JL
机构
[1] Metallurgical Laboratory, Technical University, Delft
来源
ACTA METALLURGICA | 1969年 / 17卷 / 10期
关键词
D O I
10.1016/0001-6160(69)90147-3
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
Oxidation of Cu-Si alloys with up to 4.1 wt.% Si in air is examined between 700 and 950°C. Five types of oxidation behaviour are described, ranging from subscales without inner oxide films to a continuous SiO2 film at the alloy-CuO interface. Breaking up of inner oxide films at low Si concentrations, preferential oxidation of copper at higher Si concentrations and the effect of selective pre-oxidation of Si are discussed. SiO2 is more permeable for Cu than for Si. © 1969.
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页码:1311 / +
页数:1
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