SPECTROSCOPIC INVESTIGATION OF THE DISCHARGE FOR PA-CVD OF TIN

被引：19

作者：

RIE, KT

GEBAUER, A

WOHLE, J

机构：

[1] Institut für Oberflächentechnik und plasmatechnische Werkstoffentwicklung, Technische Universität Braunschweig, Braunschweig, D-W-3300

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1993年 / 13卷 / 01期

关键词：

PA-CVD; PULSED DC DISCHARGE; TIN LAYERS; EMISSION SPECTROSCOPY;

D O I：

10.1007/BF01447172

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

Investigations of the discharge for PA-CVD of TiN on steel substrates are carried out using optical emission spectroscopy. A great number of species could be identified in the discharge. The growth rate of dense layers shows a direct dependence on Ti+ intensities. The occurrence of TiN in the discharge leads to flaky, not compact layers, lowering the hardness of the layers.

引用

页码：93 / 101

页数：9

共 8 条

[1] HOW TIN COATINGS IMPROVE THE PERFORMANCE OF HIGH-SPEED STEEL CUTTING TOOLS [J].

HEDENQVIST, P ;

OLSSON, M ;

WALLEN, P ;

KASSMAN, A ;

HOGMARK, S ;

JACOBSON, S .

SURFACE & COATINGS TECHNOLOGY, 1990, 41 (02) :243-256

[2]

KULAKOWSKA B, 1989, 1ST P INT C PLASM SU

[3]

Li Shizhi, 1984, Plasma Chemistry and Plasma Processing, V4, P147, DOI 10.1007/BF00566838

[4]

Pearse RWB, 1976, IDENTIFI CATION MOL, V4th, DOI DOI 10.1007/978-94-009-5758-9

[5] SPECTROSCOPIC INVESTIGATION OF N2-H2-AR-TICL4-ASSISTED CHEMICAL VAPOR-DEPOSITION DISCHARGE FOR PLASMA OF TIN [J].

RIE, KT ;

WOHLE, J .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 139 :37-40

[6]

RIE KT, 1987, 1987 P EUR JER

[7]

RIE KT, 1989, 1ST P C PLASM SURF E

[8]

Striganov A. R., 1966, TABLITSY SPEKTRALNYK

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