PHOTOLITHOGRAPHIC MICROMOLDING OF CERAMICS USING PLASMA-ETCHED POLYIMIDE PATTERNS

被引:18
作者
BRIDE, JA
BASKARAN, S
TAYLOR, N
HALLORAN, JW
JUAN, WH
PANG, SW
ODONNELL, M
机构
[1] UNIV MICHIGAN,DEPT ELECT ENGN & COMP SCI,SOLID STATE ELECTR LAB,ANN ARBOR,MI 48109
[2] UNIV MICHIGAN,DEPT ELECT ENGN & COMP SCI,BIOMED ULTRASON LAB,ANN ARBOR,MI 48109
关键词
D O I
10.1063/1.110151
中图分类号
O59 [应用物理学];
学科分类号
摘要
Features as fine as 4 mum with high aspect ratio were produced from ceria-zirconia ceramic using a thick plasma-etched polyimide layer as a micromold.
引用
收藏
页码:3379 / 3381
页数:3
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