FORMATION OF EPITAXIAL NIO BY OXYGEN IMPLANTATION IN [100] NI

被引：17

作者：

TOSIC, MM

DRIGO, AV

COHEN, C

THOME, L

CHAUMONT, J

BERNAS, H

CARNERA, A

机构：

[1] INST PHYS NUCL,F-91406 ORSAY,FRANCE

[2] CTR SPECTROMETRIE MASSE,ORSAY,FRANCE

[3] UNIV PADUA,IST FIS,CNRS,GNSM UNIT,I-35100 PADUA,ITALY

[4] ECOLE NATL SUPER CHIM,PHYS SOLIDES GRP,F-75231 PARIS 05,FRANCE

来源：

NUCLEAR INSTRUMENTS & METHODS | 1981年 / 182卷 / APR期

关键词：

D O I：

10.1016/0029-554X(81)90704-7

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：303 / 313

页数：11

共 21 条

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