A PHYSICAL INTERPRETATION OF THE HALL-EFFECT IN AMORPHOUS-SEMICONDUCTORS

被引：10

作者：

KAKALIOS, J

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1989年 / 114卷

关键词：

D O I：

10.1016/0022-3093(89)90167-1

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：372 / 374

页数：3

共 9 条

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[9] ELECTRONIC-PROPERTIES OF MICROCRYSTALLINE SILICON FILMS PREPARED IN A GLOW-DISCHARGE PLASMA [J].

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