STOECHIOMETRIC ANALYSIS OF EVAPORATED SILICON OXIDE FILMS BY SIMULTANEOUS OBSERVATION OF (D,P) NUCLEAR REACTIONS ON OXYGEN AND SILICON

被引：11

作者：

CACHARD, A

PIVOT, J

ROGER, A

TALVAT, M

THOMAS, JP

机构：

来源：

REVUE DE PHYSIQUE APPLIQUEE | 1971年 / 6卷 / 03期

关键词：

D O I：

10.1051/rphysap:0197100603027900

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：279 / &

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[1] A NUCLEAR METHOD FOR ANALYSING IMPURITIES INSERTED IN METALS BY THEIR SURFACE STATE PREPARATIONS . APPLICATION TO ZIRCONIUM
AMSEL, G
DAVID, D
BERANGER, G
BOISOT, P
DEGELAS, B
LACOMBE, P
[J]. JOURNAL OF NUCLEAR MATERIALS, 1969, 29 (02) : 144 - &
[2] MICROANALYSIS OF STABLE ISOTOPES OF OXYGEN BY MEANS OF NUCLEAR REACTIONS
AMSEL, G
SAMUEL, D
[J]. ANALYTICAL CHEMISTRY, 1967, 39 (14) : 1689 - &
[3] AMSEL G, 1964, ANN PHYS-PARIS, V9, P297
[4] INFLUENCE OF ELECTROLYTE ON COMPOSITION OF ANODIC OXIDE FILMS ON TANTALUM
AMSEL, G
CHERKI, C
FEUILLADE, G
NADAI, JP
[J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1969, 30 (09) : 2117 - +
[5] METALLURGICAL APPLICATIONS OF MICROANALYSIS BY DIRECT OBSERVATION OF NUCLEAR REACTIONS
AMSEL, G
DAVID, D
[J]. REVUE DE PHYSIQUE APPLIQUEE, 1968, 3 (04): : 373 - &
[6] DIELECTRIC PROPERTIES OF FILMS FORMED BY VACUUM EVAPORATION OF SILICON MONOXIDE
ANASTASIO, TA
[J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (06) : 2606 - +
[7] BERRY RW, 1968, THIN FILM TECHN, P155
[8] CASTAING R, 1962, CR HEBD ACAD SCI, V255, P1893
[9] CASTAING R, 1960, ADVANCES ELECTRONICS, V12, P759
[10] DESCROIX E, 1970, THESIS LYON