STRUCTURAL, ELECTRICAL AND OPTICAL-PROPERTIES OF CUXS LAYERS PRODUCED BY REACTIVE RF SPUTTERING

被引：11

作者：

RADLER, K

FREY, H

MULLER, W

SCHULLER, KH

VONWIENSKOWSKI, J

机构：

[1] Leybold-Heraeus GmbH

来源：

THIN SOLID FILMS | 1979年 / 59卷 / 01期

关键词：

D O I：

10.1016/0040-6090(79)90359-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of CuxS (0.3-0.5μm thick) were produced by r.f. sputtering using hydrogen and H2S as additives to the sputter gas argon. The electrical resistivity and the optical properties of the films show marked changes when the concentration of the reactive part of the sputter gas exceeds 1%. These changes correspond to a variation in the chemical composition of the CuxS layers. The films are polycrystalline and consist of a mixture crystallographic phases that are not in thermodynamic equilibrium in all of the sputtered layers. © 1979.

引用

页码：13 / 24

页数：12

共 23 条

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