ELECTRODEPOSITION OF PBS FILMS FROM ACIDIC SOLUTION

被引：48

作者：

TAKAHASHI, M

OHSHIMA, Y

NAGATA, K

FURUTA, S

机构：

[1] Department of Industrial Chemistry, Chubu University, Kasugai, Aichi, 487, Matsumotocho

来源：

JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 1993年 / 359卷 / 1-2期

关键词：

D O I：

10.1016/0022-0728(93)80415-E

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

The electrodeposition of PbS films from an acidic solution containing Na2S2O3 and Pb(NO3)(2) has been investigated. The cathodic deposition mechanism and the composition of the films deposited were examined by cyclic voltammetry, X-ray diffraction measurement and X-ray photoelectron spectroscopy measurement. PbS films have been deposited at -0.60 V vs. Ag/AgCl from an acidic solution with a pH value less than 3.0, containing 1 mM Na2S2O3 and 1 mM Pb(NO3)(2). In the cathodic electrodeposition of PbS films from an acidic solution, colloidal sulfur played an important role.

引用

页码：281 / 286

页数：6

共 15 条

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ANDERSON JR, 1975, STRUCTURE METALLIC C, P365

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