EPITAXIAL-GROWTH AND PROPERTIES OF CA1-XSRXCUO2 THIN-FILM (X = 0.18 TO 1.0) PREPARED BY CODEPOSITION AND ATOMIC LAYER STACKING

被引:51
作者
LI, XM
KANAI, M
KAWAI, T
KAWAI, S
机构
[1] The Institute of Scientific and Industrial Research, Osaka University, Osaka, Ibaraki, 567, Mihogaoka
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1992年 / 31卷 / 3A期
关键词
LASER MOLECULAR BEAM EPITAXY; CA1-XSRXCUO2; ATOMIC LAYER GROWTH;
D O I
10.1143/JJAP.31.L217
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thin films of Ca1-xSrxCuO2 have been prepared on SrTiO3 (100) substrates by co-deposition of all elements and successive stacking of atomic layers. When all the elements are deposited simultaneously, Ca1-xSrxCuO2 films can be formed only within the narrow range of Sr concentration near x = 0.2. On the other hand, by stacking atomic layers of Ca(Sr)Ox and CuO(x), the appropriate range becomes much wider and the formation of an infinite layer structure becomes possible, even in Ca free composition, SrCuO2. For the SrCuO2 thin film, a diamagnetic transition and decrease of resistance have been observed at 65 K.
引用
收藏
页码:L217 / L220
页数:4
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