NEW STRUCTURE OF SPUTTERED TANTALUM

被引：25

作者：

DAS, G

机构：

来源：

THIN SOLID FILMS | 1972年 / 12卷 / 02期

关键词：

D O I：

10.1016/0040-6090(72)90094-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：305 / &

共 12 条

[1] EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS [J].

GERSTENBERG, D ;

CALBICK, CJ .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) :402-&

[2] MASS SPECTROMETRY OF IONS IN GLOW DISCHARGES .3. NITROGEN AND ITS MIXTURES WITH HYDROGEN AND OXYGEN [J].

KNEWSTUBB, PF ;

TICKNER, AW .

JOURNAL OF CHEMICAL PHYSICS, 1962, 37 (12) :2941-&

[3] THIN FILMS DEPOSITED BY BIAS SPUTTERING [J].

MAISSEL, LI ;

SCHAIBLE, PM .

JOURNAL OF APPLIED PHYSICS, 1965, 36 (01) :237-&

[4] FORMATION OF FCC BCC AND BETA-TANTALUM FILMS BY EVAPORATION [J].

MARCUS, RB ;

QUIGLEY, S .

THIN SOLID FILMS, 1968, 2 (5-6) :467-&

[5]

READ MH, 1965, APPL PHYS LETTERS, V7, P5

[6] PHASE INSTABILITY IN DILUTE INTERSTITIAL SOLID SOLUTIONS OF NITROGEN IN TANTALUM [J].

SERAPHIM, DP ;

NOVICK, DT ;

STEMPLE, NR .

JOURNAL OF APPLIED PHYSICS, 1962, 33 (01) :136-&

[7] DOMAIN PATTERNS IN COLUMBIUM ( NIOBIUM )1 ) NB FOILS DOMAIN STRUCTURE INTERSTITIAL ORDERING ANTIFERROMAGNETISM ELECTRON MICROSCOPY ELECTRON DIFFRACTION E ) [J].

VANLANDUYT, J ;

AMELINCKX, S .

APPLIED PHYSICS LETTERS, 1964, 4 (01) :15-&

[8]

VANTORNE LI, 1964, ACTA METALL MATER, V12, P601

[9] ORDERED DOMAINS AND C/A RATIO OF TA64C (ELECTRON TRANSMISSION MICROSCOPY AND DIFFRACTION E) [J].

VILLAGRA.R ;

THOMAS, G .

APPLIED PHYSICS LETTERS, 1965, 6 (04) :61-&

[10]

VILLAGRANA R, 1966, ACTA MET, V14, P1633

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