H-2 AND RARE-GAS FIELD-ION SOURCE WITH HIGH ANGULAR CURRENT

被引:58
作者
HANSON, GR
SIEGEL, BM
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期
关键词
D O I
10.1116/1.570317
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1875 / 1878
页数:4
相关论文
共 25 条
[1]   FIM ATOM PROBE ANALYSIS OF INDIVIDUAL IMAGE SPOTS CAUSED BY GAS ADSORPTION [J].
BRENNER, SS ;
MCKINNEY, JT .
SURFACE SCIENCE, 1970, 20 (02) :411-&
[2]   FIELD IONIZATION CHARACTERISTICS OF INDIVIDAL ATOMIC PLANES [J].
CHEN, YC ;
SEIDMAN, DN .
SURFACE SCIENCE, 1971, 27 (02) :231-&
[3]  
ESOVITZ WH, 1978, ANN NY ACAD SCI B, V30, P183
[4]  
GOMER R, 1961, FIELD EMISSION FIELD, P64
[5]  
GOMER R, UNPUBLISHED
[6]   FIELD IONIZATION FROM HELIUM FILMS [J].
HALPERN, B ;
GOMER, R .
JOURNAL OF CHEMICAL PHYSICS, 1969, 51 (12) :5709-&
[7]   DISSOCIATIVE FIELD-IONIZATION OF H2 AND HD [J].
HANSON, GR .
JOURNAL OF CHEMICAL PHYSICS, 1975, 62 (03) :1161-1180
[8]   FIELD IONIZATION FROM H2 LAYERS [J].
JASON, A ;
HALPERN, B ;
INGHRAM, MG ;
GOMER, R .
JOURNAL OF CHEMICAL PHYSICS, 1970, 52 (05) :2227-&
[9]   ION-BEAM FABRICATION OF 400-A, HIGH ASPECT-RATIO LINES IN POLY METHYL-METHACRYLATE (PMMA) [J].
KARAPIPERIS, L ;
LEE, CA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1625-1625
[10]   MICROFABRICATION IN LINBO3 BY ION-BOMBARDMENT-ENHANCED ETCHING [J].
KAWABE, M ;
KUBOTA, M ;
MASUDA, K ;
NAMBA, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :1096-1098