PREPARATION AND PROPERTIES OF AMORPHOUS HYDROGENATED A-SI1-XCX-H COATINGS DEPOSITED BY RF PLASMA-ENHANCED CVD

被引：13

作者：

MENEVE, J ^{[1
]}

DEKEMPENEER, E ^{[1
]}

JACOBS, R ^{[1
]}

EERSELS, L ^{[1
]}

VANDENBERGH, V ^{[1
]}

SMEETS, J ^{[1
]}

机构：

[1] VITO, DEPT MAT, B-2400 MOL, BELGIUM

来源：

关键词：

D O I：

10.1016/0925-9635(92)90164-J

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This paper reports on the properties of a-Si1 - xCx:H thin films (0.5≤x≤1) grown by radio frequency (RF) plasma-enhanced chemical vapour deposition at low temperatures (below 300 °C), starting from CH4 SiH4 gas mixtures. The films were characterized by electron probe microanalysis and by the determination of the optical constants (optical gap Eopt and refractive index n). Ball-on-disk friction measurements showed a strong composition dependence of the friction behavior. For x=0.7, a friction coefficient of 0.07 was found in a wet nitrogen atmosphere (50% relative humidity). Scanning electron microscopy-energy dispersing X-ray analysis showed that the wear mechanism consists in material transfer from the coating to the counterbody (steel ball or aluminum pin). © 1992.

引用

页码：553 / 557

页数：5

共 19 条

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