SUPERCONDUCTING Ba1-xKxBiO3 THIN FILM BY IN-SITU SPUTTERING

被引：7

作者：

Hu, R. ^{[1
]}

Lee, A. E. ^{[1
]}

Chan, H. W. ^{[1
]}

Pettiette-Hall, C. L. ^{[1
]}

机构：

[1] TRW Space & Technol Grp, 1 Space Pk, Redondo Beach, CA 90278 USA

来源：

IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY | 1993年 / 3卷 / 01期

关键词：

D O I：

10.1109/77.233368

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We have grown superconducting Ba1-xKxBiO3 thin films with T-C(R=0) as high as 29.2 K using off-axis rf magnetron sputtering. Films are routinely deposited with zero resistance between 25 K and 29 K. High pressure during deposition is considered to be responsible for higher T-C films. The films grow expitaxially with (100) orientation on (100) SrTiO3 substrates. Superconducting Ba1-xKxBiO3 films have also been deposited on YBa2Cu3O7-x films.

引用

页码：1556 / 1558

页数：3

共 9 条

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