MEMORY CELL AND TECHNOLOGY ISSUES FOR 64-MBIT AND 256-MBIT ONE-TRANSISTOR CELL MOS DRAMS

被引:69
作者
TASCH, AF
PARKER, LH
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D O I
10.1109/5.24125
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码:374 / 388
页数:15
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共 72 条
[1]  
Ando S., 1985, 1985 Symposium on VLSI Technology. Digest of Technical Papers, P90
[2]  
Aoki M., 1988, 1988 IEEE International Solid-State Circuits Conference. Digest of Technical Papers. 31st ISSCC. First Edition, P250
[3]  
APPELS JA, 1970, PHILIPS RES REP, V25, P118
[4]   LEAKAGE STUDIES IN HIGH-DENSITY DYNAMIC MOS MEMORY DEVICES [J].
CHATTERJEE, PK ;
TAYLOR, GW ;
TASCH, AF ;
FU, HS .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1979, 14 (02) :486-498
[5]  
CHATTERJEE PK, 1986, 1986 IEEE IEDM LOS A, P128
[6]   ALPHA-PARTICLE INDUCED CHARGE-TRANSFER BETWEEN CLOSELY SPACED TRENCH CAPACITOR MEMORY CELLS [J].
CHERN, JH ;
YANG, P ;
PATTNAIK, P ;
SEITCHIK, JA ;
WENG, KCK .
IEEE ELECTRON DEVICE LETTERS, 1985, 6 (10) :534-535
[7]  
Dennard R. H., 1968, U.S. Patent, Patent No. [3387286, 3,387,286]
[8]   DETERMINATION OF URANIUM AND THORIUM IN SEMICONDUCTOR MEMORY MATERIALS BY HIGH FLUENCE NEUTRON-ACTIVATION ANALYSIS [J].
DYER, FF ;
EMERY, JF ;
NORTHCUTT, KJ ;
SCOTT, RM .
JOURNAL OF RADIOANALYTICAL CHEMISTRY, 1982, 72 (1-2) :53-67
[9]  
Eaton S. S., 1988, 1988 IEEE International Solid-State Circuits Conference. Digest of Technical Papers. 31st ISSCC. First Edition, P130
[10]  
Fujii S., 1986, 1986 IEEE International Solid-State Circuits Conference. Digest of Technical Papers (Cat. No.86CH2263-2), P266