ABSOLUTE RADICAL DENSITY-MEASUREMENTS IN A CH4-H2 DC DISCHARGE

被引：10

作者：

MENNINGEN, KL

CHILDS, MA

TOYODA, H

UEDA, Y

ANDERSON, LW

LAWLER, JE

机构：

[1] NAGOYA UNIV,DEPT ELECT ENGN,CHIKUSA KU,NAGOYA 46401,JAPAN

[2] MITSUBISHI HEAVY IND CO LTD,TAKASAGO,HYOGO 676,JAPAN

来源：

DIAMOND AND RELATED MATERIALS | 1994年 / 3卷 / 4-6期

关键词：

D O I：

10.1016/0925-9635(94)90196-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A highly sensitive multi-element optical absorption technique is used to measure the absolute column density of both CH3 and CH radicals in a d.c. hollow cathode plasma-assisted chemical vapor deposition (CVD) system with CH4 and H2 used as the input gases. The plasma gas temperature is determined at different spatial points using the H-2 emission spectrum. The temperature and radical density spatial maps provide clues to the chemical processes taking place in the discharge. CH3 and CH radical density measurements made in a hot-filament CVD system are compared with those made in the d.c. discharge CVD system.

引用

收藏

页码：422 / 425

页数：4

相关论文

共 30 条

[1] LOW-PRESSURE, METASTABLE GROWTH OF DIAMOND AND DIAMONDLIKE PHASES [J].

ANGUS, JC ;

HAYMAN, CC .

SCIENCE, 1988, 241 (4868) :913-921

[2] LIFETIME MEASUREMENTS ON ELECTRONICALLY EXCITED CH(A2DELTA) RADICALS [J].

BECKER, KH ;

BRENIG, HH ;

TATARCZYK, T .

CHEMICAL PHYSICS LETTERS, 1980, 71 (02) :242-245

[3] MEASUREMENT OF CH AND CN CONCENTRATION IN FLAMES BY LASER-INDUCED SATURATED FLUORESCENCE [J].

BONCZYK, PA ;

SHIRLEY, JA .

COMBUSTION AND FLAME, 1979, 34 (03) :253-264

[4] FOURIER-TRANSFORM DIAGNOSTICS OF GASEOUS SPECIES DURING MICROWAVE ASSISTED DIAMOND DEPOSITION [J].

CAMPARGUE, A ;

CHENEVIER, M ;

FAYETTE, L ;

MARCUS, B ;

MERMOUX, M ;

ROSS, AJ .

APPLIED PHYSICS LETTERS, 1993, 62 (02) :134-136

[5] DIRECT MONITORING OF CH3 IN A FILAMENT-ASSISTED DIAMOND CHEMICAL VAPOR-DEPOSITION REACTOR [J].

CELII, FG ;

BUTLER, JE .

JOURNAL OF APPLIED PHYSICS, 1992, 71 (06) :2877-2883

[6] INFRARED DETECTION OF GASEOUS SPECIES DURING THE FILAMENT-ASSISTED GROWTH OF DIAMOND [J].

CELII, FG ;

PEHRSSON, PE ;

WANG, HT ;

BUTLER, JE .

APPLIED PHYSICS LETTERS, 1988, 52 (24) :2043-2045

[7] TEMPERATURE AND CONCENTRATION DISTRIBUTION OF H2 AND H-ATOMS IN HOT-FILAMENT CHEMICAL-VAPOR DEPOSITION OF DIAMOND [J].

CHEN, KH ;

CHUANG, MC ;

PENNEY, CM ;

BANHOLZER, WF .

JOURNAL OF APPLIED PHYSICS, 1992, 71 (03) :1485-1493

[8] DETECTION OF CH3 DURING CVD GROWTH OF DIAMOND BY OPTICAL-ABSORPTION [J].

CHILDS, MA ;

MENNINGEN, KL ;

CHEVAKO, P ;

SPELLMEYER, NW ;

ANDERSON, LW ;

LAWLER, JE .

PHYSICS LETTERS A, 1992, 171 (1-2) :87-89

[9] MEASUREMENTS OF THE GAS KINETIC TEMPERATURE IN A CH4-H2 DISCHARGE DURING THE GROWTH OF DIAMOND [J].

CHU, HN ;

DENHARTOG, EA ;

LEFKOW, AR ;

JACOBS, J ;

ANDERSON, LW ;

LAGALLY, MG ;

LAWLER, JE .

PHYSICAL REVIEW A, 1991, 44 (06) :3796-3803

[10] A CW LASER-ABSORPTION DIAGNOSTIC FOR METHYL RADICALS [J].

DAVIDSON, DF ;

CHANG, AY ;

DIROSA, MD ;

HANSON, RK .

JOURNAL OF QUANTITATIVE SPECTROSCOPY & RADIATIVE TRANSFER, 1993, 49 (05) :559-571