TRANSMISSION OF LOW-ENERGY (LESS-THAN-10 EV) O+ IONS THROUGH SEVERAL MONOLAYER THICK RARE-GAS FILMS

被引：41

作者：

SACK, NJ ^{[1
]}

AKBULUT, M ^{[1
]}

MADEY, TE ^{[1
]}

机构：

[1] RUTGERS STATE UNIV,SURFACE MODIFICAT LAB,PISCATAWAY,NJ 08855

来源：

PHYSICAL REVIEW LETTERS | 1994年 / 73卷 / 06期

关键词：

D O I：

10.1103/PhysRevLett.73.794

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We present the first systematic study of the transmission of low energy oxygen ions (< 10 eV) through ultrathin films of Ar, Kr, and Xe. For rare gas films adsorbed on an oxidized W(100) surface, we find that a small fraction of O+ can penetrate more than 5 ML thick films of Kr and Xe. The attenuation of O+ is strongest for Ar overlayers. We attribute the attenuation mainly to elastic scattering of the ions with the rare gas atoms. We suggest that structural characteristics of rare gas films adsorbed on this surface are the cause for low attenuation in the first 1-2 monolayers.

引用

页码：794 / 797

页数：4

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