PHOTOCHEMICAL FREE-VOLUME GENERATION IN POLY(METHYL METHACRYLATE) PHOTORESISTS

被引：5

作者：

LIMM, W

WINNIK, MA

SMITH, BA

机构：

[1] UNIV TORONTO,DEPT CHEM,TORONTO M5S 1A1,ONTARIO,CANADA

[2] IBM CORP,DIV RES,ALMADEN RES CTR,SAN JOSE,CA 95120

来源：

POLYMER ENGINEERING AND SCIENCE | 1989年 / 29卷 / 14期

关键词：

D O I：

10.1002/pen.760291406

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：911 / 915

页数：5

共 14 条

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