THE RF VOLTAGE CURRENT CHARACTERISTICS AND RELATED DC NEGATIVE BIAS PROPERTIES OF AN ELECTROTECH FLAT BED PLASMA ETCHER

被引：4

作者：

MORGAN, RA

机构：

来源：

关键词：

D O I：

10.1016/0042-207X(82)93818-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：297 / 303

页数：7

共 12 条

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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 5 - 15
[6] RF SPUTTERING OF GRAPHITE IN ARGON-OXYGEN MIXTURES
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OJHA, SM
[J]. VACUUM, 1976, 26 (06) : 233 - 235
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[8] Morgan R. M., UNPUB
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