AN INVESTIGATION OF HARDNESS AND ADHESION OF SPUTTER-DEPOSITED ALUMINUM ON SILICON BY UTILIZING A CONTINUOUS INDENTATION TEST

被引:97
作者
STONE, D
LAFONTAINE, WR
ALEXOPOULOS, P
WU, TW
LI, CY
机构
[1] CORNELL UNIV,ITHACA,NY 14853
[2] IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95192
关键词
D O I
10.1557/JMR.1988.0141
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:141 / 147
页数:7
相关论文
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