PROCESSES IN A PLASMA-ARC INSTALLATION FOR VACUUM COATING DEPOSITIONS .1. PLASMA GENERATION

被引:19
作者
GOROKHOVSKY, VI [1 ]
POLISTCHOOK, VP [1 ]
YARTSEV, IM [1 ]
机构
[1] RUSSIAN ACAD SCI,INST HIGH TEMP,MOSCOW 127412,RUSSIA
关键词
D O I
10.1016/0257-8972(93)90210-F
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This paper presents the results of research on energy and mass transfer at the surface of evaporated electrodes in low pressure arcs. It is shown that, when the electrode temperature is sufficiently high, the arcs may have diffusive electrode spots. The parameters of this discharge are determined by the cathode material and the temperature conditions on the electrode. The characteristics of the cathode material are described by the atom-electron ratio xi, which is determined by the ratio of flows of thermally evaporated atoms to electrons from the cathode. The conditions of existence and the primary characteristics of vacuum arcs with a cathode diffusive spot are analysed. The characteristics of discharge on an evaporating hot anode and a.c. arc are investigated. The parameters for process optimization and the coating deposition equipment are discussed.
引用
收藏
页码:101 / 107
页数:7
相关论文
共 16 条
[1]  
Aksenov I. I., 1984, Soviet Physics - Technical Physics, V29, P893
[2]  
ASINOVSKY EI, 1985, 18 P INT C PHEN IO 1, P416
[3]   ION FLUX CHARACTERISTICS IN ARC VAPOR-DEPOSITION OF TIN [J].
BERGMAN, C .
SURFACE & COATINGS TECHNOLOGY, 1988, 36 (1-2) :243-255
[4]  
BRONIN SY, 1988, 13 P INT S DISCH EL, P544
[5]  
DORODNOV AM, 1981, ZH TEKH FIZ+, V51, P504
[6]  
GOROKHOVSKII VI, 1987, ZH TEKH FIZ+, V57, P2267
[7]  
GOROKHOVSKY VI, 1988, TEPLOFIZ VYS TEMP, V26, P239
[8]  
GOROKHOVSKY VI, 1988, HIGH ENERG CHEM, V23, P356
[9]  
HUNCHFIELD JL, 1989, IEEE T PLASMA SCI, V17, P705
[10]  
LAFFERTY JM, 1980, VACUUM ARCS THEORY A, P390