PHOTOELECTROCHEMICAL INVESTIGATIONS OF THIN METAL-OXIDE FILMS - TIO2, AL2O3, AND HFO2 ON THE PARENT METALS

被引：40

作者：

SUKAMTO, JPH

MCMILLAN, CS

SMYRL, W

机构：

[1] Corrosion Research Center, Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis

来源：

ELECTROCHIMICA ACTA | 1993年 / 38卷 / 01期

关键词：

PHOTOELECTROCHEMICAL MICROSCOPY; DYE SENSITIZATION; PHOTOEMISSION; INTERNAL REFLECTIONS;

D O I：

10.1016/0013-4686(93)80005-K

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Photoelectrochemical measurements on thin metal-oxide films are discussed. It is shown that for very thin films, multiple internal reflection effects cause the photocurrent to be a strong function of film thickness. The discussion also includes metal-oxide/electrolyte interface dominated photocurrent and metal-oxide/metal interface dominated internal photoemission processes

引用

页码：15 / 27

页数：13

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