INFLUENCE OF NITRIDE THICKNESS VARIATIONS ON SWITCHING SPEED OF MNOS MEMORY TRANSISTORS

被引:1
作者
BRUUN, E
机构
关键词
D O I
10.1109/T-ED.1978.19275
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:1328 / 1331
页数:4
相关论文
共 4 条
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  • [2] DISCHARGE OF MNOS STRUCTURES AT ELEVATED-TEMPERATURES
    LUNDKVIST, L
    SVENSSON, C
    HANSSON, B
    [J]. SOLID-STATE ELECTRONICS, 1976, 19 (03) : 221 - 227
  • [3] LUNDSTROM I, 1972, IEEE T ELECTRON DEV, V19, P826
  • [4] LOW-FIELD TRANSIENT-BEHAVIOR OF MNOS DEVICES
    MAES, HE
    VANOVERSTRAETEN, RJ
    [J]. JOURNAL OF APPLIED PHYSICS, 1976, 47 (02) : 664 - 666