学术探索
学术期刊
新闻热点
数据分析
智能评审
立即登录
ELECTRON-SPIN RESONANCE OF DANGLING BONDS IN HIGHLY DISORDERED LAYERS PRODUCED BY ION-IMPLANTATION IN GAP
被引:2
作者
:
MATSUMORI, T
论文数:
0
引用数:
0
h-index:
0
MATSUMORI, T
MIYAZAKI, K
论文数:
0
引用数:
0
h-index:
0
MIYAZAKI, K
SHIGETOMI, S
论文数:
0
引用数:
0
h-index:
0
SHIGETOMI, S
机构
:
来源
:
APPLIED PHYSICS LETTERS
|
1983年
/ 42卷
/ 06期
关键词
:
D O I
:
10.1063/1.93990
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:521 / 523
页数:3
相关论文
共 4 条
[1]
ELECTRON SPIN RESONANCE IN AMORPHOUS SILICON, GERMANIUM, AND SILICON CARBIDE
BRODSKY, MH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Research Division, Yorktown Heights
BRODSKY, MH
TITLE, RS
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Research Division, Yorktown Heights
TITLE, RS
[J].
PHYSICAL REVIEW LETTERS,
1969,
23
(11)
: 581
-
&
[2]
ESR AND OPTICAL ABSORPTION STUDIES OF ION-IMPLANTED SILICON
CROWDER, BL
论文数:
0
引用数:
0
h-index:
0
CROWDER, BL
TITLE, RS
论文数:
0
引用数:
0
h-index:
0
TITLE, RS
BRODSKY, MH
论文数:
0
引用数:
0
h-index:
0
BRODSKY, MH
PETTIT, GD
论文数:
0
引用数:
0
h-index:
0
PETTIT, GD
[J].
APPLIED PHYSICS LETTERS,
1970,
16
(05)
: 205
-
&
[3]
HASKELL JD, 1971, 2ND P INT C IMPL SEM, P193
[4]
AMORPHOUS GAP PRODUCED BY ION-IMPLANTATION
SHIMADA, T
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
SHIMADA, T
KATO, Y
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
KATO, Y
SHIRAKI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
SHIRAKI, Y
KOMATSUBARA, KF
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
KOMATSUBARA, KF
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1976,
37
(03)
: 305
-
313
←
1
→
共 4 条
[1]
ELECTRON SPIN RESONANCE IN AMORPHOUS SILICON, GERMANIUM, AND SILICON CARBIDE
BRODSKY, MH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Research Division, Yorktown Heights
BRODSKY, MH
TITLE, RS
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Research Division, Yorktown Heights
TITLE, RS
[J].
PHYSICAL REVIEW LETTERS,
1969,
23
(11)
: 581
-
&
[2]
ESR AND OPTICAL ABSORPTION STUDIES OF ION-IMPLANTED SILICON
CROWDER, BL
论文数:
0
引用数:
0
h-index:
0
CROWDER, BL
TITLE, RS
论文数:
0
引用数:
0
h-index:
0
TITLE, RS
BRODSKY, MH
论文数:
0
引用数:
0
h-index:
0
BRODSKY, MH
PETTIT, GD
论文数:
0
引用数:
0
h-index:
0
PETTIT, GD
[J].
APPLIED PHYSICS LETTERS,
1970,
16
(05)
: 205
-
&
[3]
HASKELL JD, 1971, 2ND P INT C IMPL SEM, P193
[4]
AMORPHOUS GAP PRODUCED BY ION-IMPLANTATION
SHIMADA, T
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
SHIMADA, T
KATO, Y
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
KATO, Y
SHIRAKI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
SHIRAKI, Y
KOMATSUBARA, KF
论文数:
0
引用数:
0
h-index:
0
机构:
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN
KOMATSUBARA, KF
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1976,
37
(03)
: 305
-
313
←
1
→