ID-DIAMOND-SAWING DAMAGE TO GERMANIUM AND SILICON

被引:15
作者
MEEK, RL
HUFFSTUTLER, MC
机构
[1] Bell Telephone Laboratories, Incorporated, Murray Hill, New Jersey
关键词
D O I
10.1149/1.2412121
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The surface damage associated with watering of germanium and silicon using an ID-saw has been investigated. Well-defined damage layers, which consist principally of microcracks and which have a depth of 25 ±5μ in ger manium and 50 ±10μ in silicon, were observed for a range of sawing param eters. In no case was there evidence to suggest bulk damage to the mate rials. On the basis of vibration studies of the specimen and ID-blade, out of plane blade vibrations and periodic abrasive contact (due to noncircularity of the center hole in the blade) appear to be the important damage mechanisms. © 1969, The Electrochemical Society, Inc. All rights reserved.
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页码:893 / +
页数:1
相关论文
共 25 条
[1]  
Amelinckx S., 1964, DIRECT OBSERVATION D
[2]  
AVERBACH BL, 1959, FRACTURE ED
[3]  
BERMAN R, 1965, PHYSICAL PROPERTI ED
[4]   LARGE-AREA JET ELECTROLYTIC POLISHING OF GE AND SI [J].
BOOKER, GR ;
STICKLER, R .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (12) :1167-1171
[5]   DEPTH OF SURFACE DAMAGE DUE TO ABRASION ON GERMANIUM [J].
BUCK, TM ;
MCKIM, FS .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1956, 103 (11) :593-597
[6]  
BUCK TM, 1960, SURFACE CHEMISTRY ME, P107
[7]  
BURKE JE, 1962, PROGRESS CERAMIC ED, V2, P3
[8]   DISTORTED LAYERS IN SILICON PRODUCED BY GRINDING AND POLISHING [J].
DASH, WC .
JOURNAL OF APPLIED PHYSICS, 1958, 29 (02) :228-229
[9]  
Friedel J., 1964, DISLOCATIONS
[10]  
GATOS HC, 1960, SURFACE CHEMISTRY ME, P107