ELECTRODEPOSITION OF SILVER UNDER DIRECT AND PULSED CURRENT

被引：21

作者：

FUKUNAKA, Y

YAMAMOTO, T

KONDO, Y

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 11期

关键词：

D O I：

10.1149/1.2096438

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：3278 / 3283

页数：6

相关论文

共 23 条

[1]

BOCKRIS JO, 1967, FUNDAMENTAL ASPECTS

[2]

BOCKRIS JO, 1964, MOD ASPECT ELECTROC, V3, pCH4

[3] MEASUREMENT OF CONCENTRATION PROFILES OF CU-2+ ION AND H+ ION NEAR A PLANE VERTICAL CATHODE BY 2-WAVELENGTH HOLOGRAPHIC-INTERFEROMETRY [J].

DENPO, K ;

OKUMURA, T ;

FUKUNAKA, Y ;

KONDO, Y .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (05) :1145-1150

[4]

DINI JW, 1963, MET FINISH, V61, P52

[5]

ETTEL VA, 1981, COMPR TREAT, V2, P237

[6]

FISCHE RH, 1954, T I MET FINISH, V31, P90

[7]

Fischer H., 1954, ELEKTROLYTISCHE ABSC

[8]

FUKUMOTO Y, 1981, KINZOKU HYOMEN GIJUT, V32, P302

[9] CONCENTRATION PROFILE OF CU-2+ ION NEAR A PLANE VERTICAL CATHODE IN ELECTROLYTES CONTAINING CUSO4 AND AN EXCESS OF H2SO4 AS A SUPPORTING ELECTROLYTE [J].

FUKUNAKA, Y ;

DENPO, K ;

IWATA, M ;

MARUOKA, K ;

KONDO, Y .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (12) :2492-2500

[10]

Fukunaka Y., UNPUB