ELECTRICAL-PROPERTIES OF RESISTIVE AND DIELECTRIC THIN-FILMS PREPARED BY REACTIVE SPUTTERING FROM A TANTALUM-TITANIUM COMPOSITE TARGET

被引：4

作者：

UMEZAWA, T ^{[1
]}

YAJIMA, S ^{[1
]}

MATSUMOTO, K ^{[1
]}

机构：

[1] HOKKAIDO UNIV,APPL ELECT RES INST,SAPPORO,HOKKAIDO 060,JAPAN

来源：

THIN SOLID FILMS | 1978年 / 52卷 / 01期

关键词：

D O I：

10.1016/0040-6090(78)90256-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：69 / 75

页数：7

相关论文

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[1] EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS
GERSTENBERG, D
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[2] PROPERTIES OF ANODIC FILMS FORMED ON REACTIVELY SPUTTERED TANTALUM
GERSTENBERG, D
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (06) : 542 - +
[3] GERSTENBERG D, 1969, SOLID STATE TECHNOL, V12, P5
[4] TANTALUM-FILM TECHNOLOGY
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SCHWARTZ, N
TIDD, ED
[J]. PROCEEDINGS OF THE IEEE, 1964, 52 (12) : 1450 - &