CHEMICAL-VAPOR-DEPOSITION OF DIAMOND

In the recent decade a multitude of diamond thin film production methods has been developed, generally based on chemical vapor deposition processes from thermally or plasma activated gas phases. Diagnostic studies, growth experiments and numerical kinetic investigations have in recent years lead to an improved understanding of the prerequisites of continuous diamond growth and of the chemical processes involved. While the mechanism of carbon incorporation into the diamond surface is not yet known completely, the gas-phase species which are essential in a diamond-growth atmosphere can be narrowed to a small number, whose role in the gas-phase chemistry is quite well known.