PERPENDICULAR RESISTANCE OF CO/CU MULTILAYERS PREPARED BY MOLECULAR-BEAM EPITAXY

被引：18

作者：

LIST, NJ

PRATT, WP

HOWSON, MA

XU, J

WALKER, MJ

GREIG, D

机构：

[1] MICHIGAN STATE UNIV,DEPT PHYS & ASTRON,E LANSING,MI 48824

[2] MICHIGAN STATE UNIV,CTR FUNDAMENTAL MAT RES,E LANSING,MI 48824

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1995年 / 148卷 / 1-2期

基金：

英国工程与自然科学研究理事会; 美国国家科学基金会;

关键词：

D O I：

10.1016/0304-8853(95)00264-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The magnetoresistance (MR) of layered metal systems with the current in a direction perpendicular to the plane of the layers (CPP) is studied. The technique for measuring the resulting very small resistances utilises a SQUID to act as a high-precision current comparator. The samples are Co/Cu multilayers grown by molecular beam epitaxy (MBE) in ultrahigh vacuum (UHV). Perpendicular resistance measurements are reported for Nb/Cu/X/Cu/Nb where X is the Co/Cu multilayer. The Co is fixed at a nominal value of 1.5 nm while the Cu is varied between 1 and 5 nm. These measurements show large oscillations in the CPP-MR as the Cu thickness is increased. A comparison is made between MBE and sputtered samples.

引用

页码：342 / 343

页数：2

共 8 条

[1] PERPENDICULAR GIANT MAGNETORESISTANCE OF MICROSTRUCTURES IN FE-CR AND CO-CU MULTILAYERS [J].