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2ND BREAKDOWN PHENOMENON OF POINT CONTACT N N+ SI WAFERS
被引:4
作者
:
AGATSUMA, T
论文数:
0
引用数:
0
h-index:
0
AGATSUMA, T
机构
:
来源
:
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS
|
1966年
/ 54卷
/ 09期
关键词
:
D O I
:
10.1109/PROC.1966.5084
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:1206 / &
相关论文
共 4 条
[1]
AGATSUMA T, 1965, P IEEE, V53, P2142
[2]
ALLEN CC, 1965 SAN FRANC M EL
[3]
A 3-POINT PROBE METHOD FOR ELECTRICAL CHARACTERIZATION OF EPITAXIAL FILMS
[J].
BROWNSON, J
论文数:
0
引用数:
0
h-index:
0
BROWNSON, J
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1964,
111
(08)
:919
-924
[4]
MEASUREMENT OF RESISTIVITY OF SILICON EPITAXIAL LAYERS BY 3-POINT PROBE TECHNIQUE
[J].
GARDNER, EE
论文数:
0
引用数:
0
h-index:
0
GARDNER, EE
;
SCHUMANN, PA
论文数:
0
引用数:
0
h-index:
0
SCHUMANN, PA
.
SOLID-STATE ELECTRONICS,
1965,
8
(02)
:165
-&
←
1
→
共 4 条
[1]
AGATSUMA T, 1965, P IEEE, V53, P2142
[2]
ALLEN CC, 1965 SAN FRANC M EL
[3]
A 3-POINT PROBE METHOD FOR ELECTRICAL CHARACTERIZATION OF EPITAXIAL FILMS
[J].
BROWNSON, J
论文数:
0
引用数:
0
h-index:
0
BROWNSON, J
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1964,
111
(08)
:919
-924
[4]
MEASUREMENT OF RESISTIVITY OF SILICON EPITAXIAL LAYERS BY 3-POINT PROBE TECHNIQUE
[J].
GARDNER, EE
论文数:
0
引用数:
0
h-index:
0
GARDNER, EE
;
SCHUMANN, PA
论文数:
0
引用数:
0
h-index:
0
SCHUMANN, PA
.
SOLID-STATE ELECTRONICS,
1965,
8
(02)
:165
-&
←
1
→