SYSTEM FOR COMBINED SIMS-AES-XPS STUDIES OF SOLIDS

[1] ANDERSEN CA, 1969, INT J MASS SPECTROM, V2, P61

[2] Blaise G., 1978, Material Characterization Using Ion Beams. Lectures Presented at the NATO Advanced Study Institute on Material Characterization Using Ion Beams, P143

[3] OXYGEN INTERACTION WITH NI-FE SURFACES (1) LEED AND XPS STUDIES OF NI 76-PERCENT-FE 24-PERCENT (100) [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 474 - 477

[4] SOME ASPECTS OF SURFACE BEHAVIOR OF SILICON [J]. SURFACE SCIENCE, 1973, 35 (01) : 1 - 7

[5] LAFF MR, 1976, RC6198 IBM RES REP

[6] SECONDARY ION QUADRUPOLE MASS-SPECTROMETER FOR DEPTH PROFILING-DESIGN AND PERFORMANCE EVALUATION [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1978, 49 (04) : 477 - 485

[7] SECONDARY ION EMISSION FROM SILICON AND SILICON-OXIDE [J]. SURFACE SCIENCE, 1975, 47 (01) : 358 - 369

[8] X-RAY PHOTOELECTRON STUDIES ON SOME OXIDES AND HYDROXIDES OF COBALT, NICKEL, AND COPPER [J]. ANALYTICAL CHEMISTRY, 1975, 47 (13) : 2208 - 2213

[9] TEST OF A QUANTITATIVE APPROACH TO SECONDARY ION MASS-SPECTROMETRY ON GLASS AND SILICATE STANDARDS [J]. ANALYTICAL CHEMISTRY, 1977, 49 (07) : 927 - 931

[10] CHARGING EFFECTS IN THE SECONDARY ION MASS-SPECTROMETRIC ANALYSIS OF TARGETS CONTAINING LOW-CONDUCTIVITY REGIONS [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (02) : 850 - 855

[1] ANDERSEN CA, 1969, INT J MASS SPECTROM, V2, P61

[2] Blaise G., 1978, Material Characterization Using Ion Beams. Lectures Presented at the NATO Advanced Study Institute on Material Characterization Using Ion Beams, P143

[3] OXYGEN INTERACTION WITH NI-FE SURFACES (1) LEED AND XPS STUDIES OF NI 76-PERCENT-FE 24-PERCENT (100) [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 474 - 477

[4] SOME ASPECTS OF SURFACE BEHAVIOR OF SILICON [J]. SURFACE SCIENCE, 1973, 35 (01) : 1 - 7

[5] LAFF MR, 1976, RC6198 IBM RES REP

[6] SECONDARY ION QUADRUPOLE MASS-SPECTROMETER FOR DEPTH PROFILING-DESIGN AND PERFORMANCE EVALUATION [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1978, 49 (04) : 477 - 485

[7] SECONDARY ION EMISSION FROM SILICON AND SILICON-OXIDE [J]. SURFACE SCIENCE, 1975, 47 (01) : 358 - 369

[8] X-RAY PHOTOELECTRON STUDIES ON SOME OXIDES AND HYDROXIDES OF COBALT, NICKEL, AND COPPER [J]. ANALYTICAL CHEMISTRY, 1975, 47 (13) : 2208 - 2213

[9] TEST OF A QUANTITATIVE APPROACH TO SECONDARY ION MASS-SPECTROMETRY ON GLASS AND SILICATE STANDARDS [J]. ANALYTICAL CHEMISTRY, 1977, 49 (07) : 927 - 931

[10] CHARGING EFFECTS IN THE SECONDARY ION MASS-SPECTROMETRIC ANALYSIS OF TARGETS CONTAINING LOW-CONDUCTIVITY REGIONS [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (02) : 850 - 855