PROJECTION PHOTOLITHOGRAPHY-LIFTOFF TECHNIQUES FOR PRODUCTION OF 0.2-MU-M METAL PATTERNS

被引：19

作者：

FEUER, MD ^{[1
]}

PROBER, DE ^{[1
]}

机构：

[1] YALE UNIV,BECTON CTR,DEPT ENGN & APPL SCI,APPL PHYS SECT,NEW HAVEN,CT 06520

来源：

关键词：

D O I：

10.1109/T-ED.1981.20616

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1375 / 1378

页数：4

共 19 条

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[3] CHARACTERIZATION OF POSITIVE PHOTORESIST
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HORNBERGER, WP
HAUGE, PS
SHAW, JM
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 445 - 452
[4] DOANE DA, 1980, SOLID STATE TECHNOL, V23, P103
[5] STENCIL TECHNIQUE FOR PREPARATION OF THIN-FILM JOSEPHSON DEVICES
DUNKLEBERGER, LN
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (01): : 88 - 90
[6] STEP-EDGE FABRICATION OF ULTRA-SMALL JOSEPHSON MICROBRIDGES
FEUER, MD
PROBER, DE
[J]. APPLIED PHYSICS LETTERS, 1980, 36 (03) : 226 - 228
[7] FEUER MD, 1979, IEEE T MAGN, V15, P578, DOI 10.1109/TMAG.1979.1060134
[8] FEUER MD, 1978, AIP C P, V44, P317
[9] FEUER MD, 1980, THESIS YALE U
[10] SINGLE-STEP OPTICAL LIFT-OFF PROCESS
HATZAKIS, M
CANAVELLO, BJ
SHAW, JM
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1980, 24 (04) : 452 - 460