ETCH RATES FOR 2 MATERIAL SELECTIVE ETCHES IN THE INGAASP INP SYSTEM

被引：8

作者：

CONWAY, KL

DENTAI, AG

CAMPBELL, JC

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 03期

关键词：

D O I：

10.1063/1.330603

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1836 / 1838

页数：3

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