CORROSION BEHAVIOR OF HAFNIUM IN BUFFER SOLUTIONS AS REVEALED BY IMPEDANCE AND POTENTIAL MEASUREMENTS

被引：26

作者：

ELBASIOUNY, MS

ELKOT, AM

HEFNY, MM

机构：

[1] Chemistry Department, Faculty of Science, Cairo University

[2] Department of Chemistry, Faculty of Science, Sana’a University

[3] Chemistry Department, Faculty of Science, Zagazig University

来源：

BRITISH CORROSION JOURNAL | 1979年 / 14卷 / 01期

关键词：

D O I：

10.1179/000705979798275979

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The growth of thin oxide films (2·0 -8·0 nm) on hafnium immersed in aqueous buffer solutions of pH 1-12 has beenfollowed by means of capacitance and potential measurements. Capacitance measurements show that the corrosion reaction film exerts an action on the behaviour of the metal, in that it determines the magnitude of the open-circuit corrosion potential. In the early stages of oxide film growth, the potential of the hafnium electrode wasfound to decrease by 59 mV/unit increase in pH, whereas in thefinal stages the potential decreased by 20-30 mV/unit increase in pH. The reason for the deviation from the 59 mV/unit increase in pH in the final stages of oxide film growth may be connected lvith non-uniform oxygen supply, or with variation of the conducting properties of the oxidefilm with its thickness. © 1979 Maney Publishing.

引用

页码：51 / 53

页数：3