FORMATION OF NH(C1-PI), NH(A3-PI) AND NCO(A2-SIGMA) IN THE VUV PHOTOLYSIS OF HNCO

被引：18

作者：

UNO, K ^{[1
]}

HIKIDA, T ^{[1
]}

HIRAYA, A ^{[1
]}

SHOBATAKE, K ^{[1
]}

机构：

[1] INST MOLEC SCI,OKAZAKI,AICHI 444,JAPAN

来源：

CHEMICAL PHYSICS LETTERS | 1990年 / 166卷 / 5-6期

关键词：

D O I：

10.1016/0009-2614(90)87136-F

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Photodissociative excitation processes of gaseous HNCO are studied in the wavelength region 107-180 nm using synchrotron radiation as a light source. Fluorescence excitation spectra of the photofragments, NH(c 1Π, A 3Π) and NCO(A 2Σ), are measured under near collision-free conditions. The quantum yields for formation of these excited radicals are also determined. © 1990.

引用

页码：475 / 479

页数：5

共 20 条

[11] PHOTODISSOCIATION OF HN3 IN VACUUM-ULTRAVIOLET PRODUCTION AND REACTIVITY OF ELECTRONICALLY EXCITED NH [J].